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How Chips Are Made

To begin another layer, a second, thinner layer of silicon dioxide is grown over the ridges and etched areas of the wafer base.

Then, a layer of polysilicon and another layer of photoresist are applied.
Ultraviolet light is then passed through a second mask, exposing a new pattern on the photoresist.

The photoresist is dissolved with solvent to expose the polysilicon and silicon dioxide, which are then etched away with chemicals.

The remaining photoresist is removed, leaving ridges of polysilicon and silicon dioxide.

Photoresist Dissolves

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